Liquid Droplet Evaporation/Combustion involving injection of C13H28 droplets into high temperature air.  The combustion process is based on global, finite-rate reaction model.  The chemical reaction model is ‘Liquid C13H28 + Air’.

Transient simulation of an internal combustion engine.

Shock wave propagation simulation with "mach" disk formation.  Multi-step finite rate chemical reaction of propellant constituents.

Time accurate simulation demonstrating flame-front propagation during the combustion process.

Chemical vapor deposition (CVD) has emerged as an important industrial technique for the manufacture of thin solid films for applications in optoelectronic devices and high-speed digital circuits. The CVD process involves introducing metered amounts of the thin film material in a gaseous state dispersed within a carrier gas into a reactor. The reactor contains a substrate placed on a susceptor.. Heating the susceptor induces the deposition of the film onto the substrate.               

Surface chemical reactions occur at a gas-solid, gas-liquid or liquid-solid interface.  The detailed mechanism about the reaction procedure is even more complicated than gas phase reaction.  Numerically, a phenomenological model is required. There are two types of surface chemical reactions that are of interest:

(1)  Catalytic reaction

(2)  Combustion reaction.

The “catalytic reaction” means that the surface (act as catalyst) induces chemical reaction and itself keeps unchanged.